Influence of magnetron sputtering conditions on the parameters of TiN coatings on steel substrates

被引：0
|
作者：
Mirchev, R.
Antonov, V.
Iordanova, I.
Kelly, P. J.
机构：
[1] Univ Sofia, Fac Phys, Dept Solid State Phys & Microelect, Sofia 1164, Bulgaria
[2] Univ Salford, Ctr Adv Mat & Surface Engn, Salford M5 4WT, Lancs, England
来源：
ZEITSCHRIFT FUR KRISTALLOGRAPHIE | 2006年
关键词：
TiN coatings; magnetron sputtering; crystallographic texture; residual stresses;
D O I：
暂无
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
The influence of the discharge current during reactive closed-field unbalanced magnetron sputtering on some important parameters of TiN coatings on steel substrates is analyzed. X-ray experiments are performed in two modes namely symmetric Bragg-Brentano (B-B) and grazing incidence asymmetric Bragg diffraction (GIABD).
引用
收藏
页码：269 / 274
页数：6
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