Hydrogenated Amorphous Carbon Films Prepared by Plasma-enhanced Chemical Vapor DepositionInst Elect Engn

被引：0
|
作者：
Huran, J. [1 ]
Kobzev, A. P. [2 ]
Balalykin, N. I. [2 ]
Pezoltd, J. [3 ]
机构：
[1] Slovak Acad Sci, Inst Elect Engn, Dubravska Cesta 9, Bratislava 84104, Slovakia
[2] Joint Inst Nucl Res, Dubna 141980, Russia
[3] TU Ilmenau, Zentrum Mikro & Nanotechnol, Ilmenau, Germany
来源：
ASDAM 2008, CONFERENCE PROCEEDINGS | 2008年
关键词：
D O I：
10.1109/ASDAM.2008.4743297
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A capacitively coupled plasma reactor was used for PECVD technology where methane was introduced into the plasma reactor through the shower head The concentration of species in the a-C:H films were determined by KBS and ERD method The RBS results showed the main concentrations of C in the films. The concentration of hydrogen was approximately 20 at.%. The films contain a small amount of oxygen and nitrogen. Chemical compositions were analyzed by IR spectroscopy. IR results showed the presence of C-H specific bonds.
引用
收藏
页码：127 / +
页数：2
相关论文
共 50 条
12345