Electron-beam lithography to improve quality of computer-generated hologram

被引:4
|
作者
Gao, F [1 ]
Zhu, JH
Huang, QZ
Zhang, YX
Zeng, YS
Gao, FH
Guo, YK
Cui, Z
机构
[1] Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
[2] Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England
关键词
computer generated hologram; electron beam lithography;
D O I
10.1016/S0167-9317(02)00570-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The quantized errors in computer generated holograms (CGH) have been analysed theoretically. In order to evaluate quantitatively the influence of these errors on the quality of reconstructed image, a signal-to-noise ratio (SNR) is introduced. It is found that the SNR of a reconstructed image is very sensitive to the accuracy of amplitude and phase. Improving the accuracy of amplitude and phase is much more effective for improvement of CGH image quality than simply increasing the sampling cells. The accuracy of amplitude and phase of a sampling cell is represented by the fidelity of sampling cell geometry. CGH plates with the same encoded image have been fabricated by both conventional photoreduction method and e-beam direct write method. The reconstructed images from both plates have been compared. The experimental result has confirmed the theoretical analysis: e-beam direct write can produce CGHs with quality superior to conventional photoreduction technique (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:363 / 369
页数:7
相关论文
共 50 条
  • [1] Computer-Generated Hologram Fabricated by Electron-Beam Lithography for Noise Reduction
    Tamura, Hitoshi
    Ishii, Yukihiro
    OPTICAL REVIEW, 2012, 19 (02) : 50 - 57
  • [2] Computer-generated hologram fabricated by electron-beam lithography for noise reduction
    Hitoshi Tamura
    Yukihiro Ishii
    Optical Review, 2012, 19 : 50 - 57
  • [3] Computer-generated hologram fabricated by electron-beam direct writing
    Gao, Feng
    Zhu, Jian-Hua
    Huang, Qi-Zhong
    Gao, Fu-Hua
    Yao, Jun
    Guo, Yong-Kang
    Cui, Zheng
    Zhongguo Jiguang/Chinese Journal of Lasers, 2001, 28 (06): : 556 - 558
  • [4] Efficient storage, computation, and exposure of computer-generated holograms by electron-beam lithography
    Newman, Daniel M., 1600, Optical Soc of America, Washington, DC, United States (32):
  • [5] EFFICIENT STORAGE, COMPUTATION, AND EXPOSURE OF COMPUTER-GENERATED HOLOGRAMS BY ELECTRON-BEAM LITHOGRAPHY
    NEWMAN, DM
    HAWLEY, RW
    GOECKEL, DL
    CRAWFORD, RD
    ABRAHAM, S
    GALLAGHER, NC
    APPLIED OPTICS, 1993, 32 (14): : 2555 - 2565
  • [6] ELECTRON-BEAM FABRICATION OF COMPUTER-GENERATED HOLOGRAMS
    ARNOLD, SM
    OPTICAL ENGINEERING, 1985, 24 (05) : 803 - 807
  • [7] Manipulation of an atomic beam by a computer-generated hologram
    Fujita, J
    Morinaga, M
    Kishimoto, T
    Yasuda, M
    Matsui, S
    Shimizu, F
    NATURE, 1996, 380 (6576) : 691 - 694
  • [8] Production of confluent hypergeometric beam by computer-generated hologram
    Chen, Jiannong
    Wang, Gang
    Xu, Qinfeng
    OPTICAL ENGINEERING, 2011, 50 (02)
  • [9] THE MAKING OF A COMPUTER-GENERATED HOLOGRAM
    Zeitner, Uwe D.
    Banasch, Michael
    Kley, Ernst-Bernhard
    PHOTONICS SPECTRA, 2008, 42 (12) : 58 - 61
  • [10] Computer-generated hologram statistics
    Lopez-Mariscal, Carlos
    LASER BEAM SHAPING XI, 2010, 7789