Effect of Deposition Time on Properties of Nanostructured ZnO Thin Films Deposited by RF Magnetron Sputtering

被引：3

作者：

Sin, N. D. Md ^{[1
]}

Mamat, M. H. ^{[1
]}

Rusop, M. ^{[1
]}

机构：

[1] Univ Teknol MARA UiTM, NANOelecTron Ctr, Fac Elect Engn, Shah Alam 40450, Malaysia

来源：

NANOSCIENCE, NANOTECHNOLOGY AND NANOENGINEERING | 2014年 / 832卷

关键词：

ZnO thin films; deposition time; electrical properties; optical properties; structural properties; THICKNESS;

D O I：

10.4028/www.scientific.net/AMR.832.460

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The effect of deposition time on properties of ZnO nanostructured thin film was investigated. The ZnO thin films were deposited at various times from 15 similar to 75 minutes. The ZnO thin film at 60 min deposition time shows the highest current density and high conductivity with 2.15x10(-2) Scm(-1). The optical properties of ZnO thin films show high transmittance with >80% at 380 nm to 1200 nm. The thickness of ZnO thin film increases linearly with deposition time. The size of ZnO thin films increase as the deposition time increase. Based on field emmision scanning electron microscopy images, the ZnO nanocolumnar structure was formed at 15 to 60 minutes deposition time while at 75 minutes the sample formed nanoflakes structure.

引用

页码：460 / 465

页数：6

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