Oxygen vacancy enhanced room temperature ferromagnetism in Ar+ ion irradiated WO3 films

被引:9
|
作者
Zheng, Xudong [1 ]
Wu, Liang [2 ,3 ]
Ren, Feng [2 ,3 ]
机构
[1] Henan Univ Sci & Technol, Sch Phys & Engn, Henan Key Lab Photoelect Energy Storage Mat & App, Luoyang 471023, Peoples R China
[2] Wuhan Univ, Sch Phys & Technol, Ctr Ion Beam Applicat, Hubei Nucl Solid Phys Key Lab, Wuhan 430072, Peoples R China
[3] Wuhan Univ, MOE Key Lab Artificial Micro & Nanostruct, Wuhan 430072, Peoples R China
基金
中国国家自然科学基金;
关键词
Ion irradiation; WO3; films; Ferromagnetism; Oxygen vacancy; TUNGSTEN-OXIDE NANOWIRES; MAGNETIC-PROPERTIES; METAL-OXIDE; CO; SPINTRONICS; DEFECTS;
D O I
10.1016/j.ceramint.2020.10.087
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Room-temperature ferromagnetism in WO3 films was enhanced by 130 keV Ar+ ion irradiation. The X-ray diffraction (XRD) and Raman measurements not only confirmed the monoclinic phase of the irradiated WO3 films, but also showed that oxygen vacancy (V-o) defects were formed. The analysis of photoluminescence spectra strongly reconfirmed the presence of oxygen vacancy. X-ray photoelectron spectroscopy (XPS) measurements revealed that the contents of V-o and induced W5+ ions increase with increasing irradiation fluence and rich W5+ V-o defect complexes in the irradiated WO3 films were formed. Further, the magnetic measurements exhibited a 2-fold enhancement in the saturation magnetization at the largest fluence of 3 x 10(16) ions/cm(2). At lower irradiation fluence, a bound magnetic polamn model was proposed to reveal the ferromagnetic exchange coupling resulting from overlapping of V-o(+) and V-o(++) defect states, and 5d(1) states of W5+. At high irradiation fluence, the carrier concentration reaches 1.02 x 10(20)/cm(3) and carrier-mediated exchange interactions result in the film's ferromagnetism.
引用
收藏
页码:5091 / 5098
页数:8
相关论文
共 50 条
  • [1] Tailoring of optical and gas sensitivity behaviors of WO3 films by low energy Ar+ ion implantation
    Keshri, Sunita
    Kumar, Ashutosh
    Kabiraj, Debdulal
    THIN SOLID FILMS, 2012, 526 : 50 - 58
  • [2] Modulation of room temperature ferromagnetism in WO3 thin films on low-cost Si wafers
    Pham, Nguyen Sy
    Hong, Nguyen Hoa
    SOLID STATE COMMUNICATIONS, 2025, 397
  • [3] Preparation of ordered nanoporous WO3 thin films and the mechanism of large room-temperature ferromagnetism
    Zhang, Junmeng
    Lu, Jianmin
    Hou, Panzhe
    Lu, Peipei
    Jia, Lingna
    Yang, Zhiyun
    Liu, Lihu
    Sun, Huiyuan
    JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2023, 43 (16) : 7533 - 7542
  • [4] Oxygen vacancy enhanced the room temperature ferromagnetism in Ni-doped TiO2 thin films
    Hou, D. L.
    Meng, H. J.
    Jia, L. Y.
    Ye, X. J.
    Zhou, H. J.
    Li, X. L.
    PHYSICS LETTERS A, 2007, 364 (3-4) : 318 - 322
  • [5] The influence of ion implantation-induced oxygen vacancy on electrical conductivity of WO3 thin films
    Zheng, X. D.
    VACUUM, 2019, 165 : 46 - 50
  • [6] The oxygen vacancy in crystal phases of WO3
    Chatten, R
    Chadwick, AV
    Rougier, A
    Lindan, PJD
    JOURNAL OF PHYSICAL CHEMISTRY B, 2005, 109 (08): : 3146 - 3156
  • [7] Oxygen vacancy mediated room temperature ferromagnetism in Cu-doped LiNbO3 thin films
    Zhou, Xiaodong
    Wang, Erlei
    Lao, Xiaodong
    Wang, Yongmei
    Yuan, Honglei
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2021, 527 (527)
  • [8] Ga-vacancy induced room temperature ferromagnetism observed in N-irradiated GaN films
    Xu, Juping
    Li, Qiang
    Zhang, Wenshuai
    Liu, Jiandang
    Du, Huaijiang
    Ye, Bangjiao
    CHEMICAL PHYSICS LETTERS, 2014, 616 : 161 - 164
  • [9] Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
    Strobel, Alexander
    Schnabel, Hans-Dieter
    Reinhold, Ullrich
    Rauer, Sebastian
    Neidhardt, Andreas
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2016, 34 (01):
  • [10] Evidence of oxygen vacancy enhanced room-temperature ferromagnetism in Co-doped ZnO
    Hsu, H. S.
    Huang, J. C. A.
    Huang, Y. H.
    Liao, Y. F.
    Lin, M. Z.
    Lee, C. H.
    Lee, J. F.
    Chen, S. F.
    Lai, L. Y.
    Liu, C. P.
    APPLIED PHYSICS LETTERS, 2006, 88 (24)