TiN coatings generated with a pulsed plasma arc

被引:16
|
作者
Bruzzone, H
Kelly, H
Marquez, A
Lamas, D
Ansaldi, A
Oviedo, C
机构
[1] CITEFA,RA-1603 VILLA MARTELLI,BUENOS AIRES,ARGENTINA
[2] COMIS NACL ENERGIA ATOM,DEPT MAT,RA-1429 BUENOS AIRES,DF,ARGENTINA
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 1996年 / 5卷 / 03期
关键词
D O I
10.1088/0963-0252/5/3/029
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A systematic study of TiN coatings produced with a low-energy pulsed plasma are (500 A peak current, 35 ms half-amplitude-full-width duration) is presented. The N-2 background pressure was varied in the range 0.6-10 mbar. Several diagnostic techniques were employed to study the coatings: Scotch tape test, weighting, scanning electron microscopy (SEM), x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and Vickers microhardness. ?he results show that two different microstructures of the coatings can be obtained by changing the operating pressure value: a low-pressure regime where ?he coating presents high porosity, with agglomerates of diameter in the range 10-60 mu m; and a high-pressure regime, for which the coatings are more uniform and dense, with agglomerates of less than 3 mu m size.
引用
收藏
页码:582 / 587
页数:6
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