user

Sematech using Applied tool

被引：0
|
作者：
不详
机构：
来源：
MICRO | 2002年 / 20卷 / 02期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：15 / 15
页数：1
相关论文
共 50 条
  • [1] Sematech pushes standards tool
    不详
    MICRO, 2002, 20 (05): : 18 - 18
  • [2] Sematech adds IML tool
    不详
    MICRO, 2005, 23 (08): : 28 - 28
  • [3] Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
    Naulleau, Patrick P.
    Anderson, Christopher N.
    Dean, Kim
    Denham, Paul
    Goldberg, Kenneth A.
    Hoef, Brian
    Niakoula, Dimitra
    La Fontaine, Bruno
    Wallow, Tom
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06): : 2132 - 2135
  • [4] Characterization of low-order aberrations in the SEMATECH Albany MET tool
    Naulleau, Patrick
    Waterman, Justin
    Dean, Kim
    EMERGING LITHOGRAPHIC TECHNOLOGIES XI, PTS 1 AND 2, 2007, 6517
  • [5] Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool
    Naulleau, Patrick P.
    Anderson, Christopher N.
    Chiu, Jerrin
    Dean, Kim
    Denham, Paul
    Goldberg, Kenneth A.
    Hoef, Brian
    Huh, Sungmin
    Jones, Gideon
    La Fontaine, Bruno
    Ma, Andy
    Niakoula, Dimitra
    Park, Joo-on
    Wallow, Tom
    EMERGING LITHOGRAPHIC TECHNOLOGIES XII, PTS 1 AND 2, 2008, 6921
  • [6] BEYOND SEMATECH
    FERGUSON, C
    ISSUES IN SCIENCE AND TECHNOLOGY, 1987, 4 (01) : 11 - 11
  • [7] Breakthroughs of Sematech
    不详
    AMERICAN CERAMIC SOCIETY BULLETIN, 2005, 84 (07): : 7 - 8
  • [8] Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool
    Anderson, Christopher N.
    Naulleau, Patrick P.
    Denham, Paul
    Kemp, Drew
    Rekawa, Senajith
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06): : 2151 - 2154
  • [9] Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
    Naulleau, Patrick P.
    Anderson, Christopher N.
    Chiu, Jerrin
    Dean, Kim
    Denham, Paul
    George, Simi
    Goldberg, Kenneth A.
    Hoef, Brian
    Jones, Gideon
    Koh, Chawon
    La Fontaine, Bruno
    Ma, Andy
    Montgomery, Warren
    Niakoula, Dimitra
    Park, Joo-on
    Wallow, Tom
    Wurm, Stefan
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2009, 27 (01): : 66 - 70
  • [10] Praise for SEMATECH
    McFadden, W. Clark, II
    ISSUES IN SCIENCE AND TECHNOLOGY, 2012, 28 (04) : 15 - 17
12345