Ambipolar SnO thin-film transistors and inverters

被引:12
|
作者
Liang, Lingyan [1 ]
Cao, Hongtao [1 ]
机构
[1] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Div Funct Mat & Nano Devices, Ningbo 315201, Zhejiang, Peoples R China
来源
THIN FILM TRANSISTORS 11 (TFT 11) | 2012年 / 50卷 / 08期
关键词
TFT; ELECTRON; PHASE;
D O I
10.1149/05008.0289ecst
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Top-contact and bottom-gate thin-film transistors (TFTs) were fabricated employing polycrystalline SnO films as the channels. The influence of channel thickness, source/drain electrode materials with different work function and post-annealing of the devices on the electrical properties of the TFTs was systematically investigated. Ambipolar TFTs which possesses balanced electron and hole field-effect mobilities were achieved. Complementary metal oxide semiconductor (CMOS) - like inverters using the SnO dual operation transistors were also demonstrated with a gain up to 30. These results also demonstrate that, a simple route in realizing oxide-based ambipolar TFTs and CMOS-like inverters, provides a robust addition to the existing CMOS technology community.
引用
收藏
页码:289 / 297
页数:9
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