Divacancies induced ferromagnetism in 3C-SiC thin films

被引:6
|
作者
Zhou, Ren-Wei [1 ,2 ]
Liu, Xue-Chao [1 ]
Zhuo, Shi-Yi [1 ]
Chen, Hong-Ming [1 ,2 ]
Shi, Biao [3 ]
Shi, Er-Wei [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 201800, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
[3] Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing 400700, Peoples R China
基金
中国国家自然科学基金;
关键词
3C-SiC thin films; Ferromagnetism; Divacancy; DEFECT;
D O I
10.1016/j.jmmm.2014.08.081
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
3C-SiC thin films were prepared by atmospheric pressure chemical vapor deposition. We performed a study on the effect of C/Si ratio on ferromagnetic properties and microstructures of 3C-SiC thin films. The 3C-SiC thin films show ferromagnetic behavior within the scope of C/Si ratio in our study. An initial increase in C/Si ratio leads to the enhancement of magnetization, while further increasing C/Si ratio reduces the magnetization. The ferromagnetism is associated with divacancy concentration in 3C-SiC thin films. Our study reveals that the ferromagnetism of 3C-SiC thin films is stable at room temperature, and this may be helpful for clarifying the current controversy of the ferromagnetism origin in diluted magnetism semiconductor. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:559 / 563
页数:5
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