Effect of deposition flux on surface roughness of LiNbO3 thin film grown on sapphire substrate by pulsed laser deposition

被引:16
|
作者
Lee, GH [1 ]
Shin, BC [1 ]
Min, BH [1 ]
机构
[1] Dong Eui Univ, Res Ctr Elect Ceram, Busanjin Ku, Pusan 614714, South Korea
关键词
LiNbO3 thin film; pulsed laser deposition; surface roughness; deposition flux; laser frequency;
D O I
10.1016/S0921-5107(02)00223-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The variation of surface morphology and roughness of LiNbO3 film on sapphire substrate with deposition flux was investigated. The film deposition was carried out by pulsed laser deposition (PLD) and then flux was controlled with frequency of pulsed laser. With increasing the deposition flux, that is the frequency of laser pulse, the film surface became smoother and thus the surface flatness was improved. In case of the frequency of 15 Hz, the rms roughness of the film surface was constrained below 2.0 nm even at the film thickness of about 300 nm. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:137 / 140
页数:4
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