Introduction to plasma enhanced chemical vapor deposition

被引：0
|
作者：
Cale, TS
Raupp, GB
Rogers, BR
Myers, FR
Zirkle, TE
机构：
来源：
PLASMA PROCESSING OF SEMICONDUCTORS | 1997年 / 336卷
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
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页码：89 / 108
页数：20
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