Research on the Calibration Technique of On-wafer Load-pull System

被引：0
|
作者：
Luan Peng [1 ]
Liang Faguo [1 ]
Han Zhiguo [1 ]
Li Jingqiang [1 ]
Qiao Yu'e [1 ]
机构：
[1] Hebei Semicond Res Inst, Shijiazhuang 050051, Peoples R China
来源：
PROCEEDINGS OF 2013 IEEE 11TH INTERNATIONAL CONFERENCE ON ELECTRONIC MEASUREMENT & INSTRUMENTS (ICEMI) | 2013年
关键词：
on-wafer; load-pull; transfer standards; calibration;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
By using load-pull technique, non-linear device behavior can be obtained through changing the source impedance or load impedance. Load-pull system is so complex that there is no effective way for its performance metrology, which results in significant variance of device parameter, such as power, gain, and PAE. This paper discusses in-situ calibration of on-wafer load-pull system and provides the verified result. The technique mentioned in this paper can calibrate the performance of the on-wafer load-pull system reliably and roundly, and give the measurement uncertainty of the system. Thus the calibration scheme is more reasonable, while the measurement result is more reliable.
引用
收藏
页码：436 / 440
页数：5
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