Surface plasmon polaritons maskless lithography of metal-dielectric multilayers with tunable resolution

被引：2
|
作者：
Wang, Jicheng [1 ]
Wang, Yueke [1 ]
Sun, Lin [1 ]
Liu, Hongjiao [1 ]
Liu, Cheng [1 ]
Gao, Shumei [1 ]
机构：
[1] Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China
来源：
OPTIK | 2014年 / 125卷 / 20期
关键词：
Suface plasmon polaritons; Lithography; Tunable resolution; INTERFERENCE NANOLITHOGRAPHY; PHOTOLITHOGRAPHY; FILM; NM;
D O I：
10.1016/j.ijleo.2014.06.120
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We report the design of surface plasmon polaritons maskless lithography based on metal-dielectric multilayers. The interference pattern is generated by the interference of the counter-propagating bulk plasmon polariton (BPP) modes, which are excited by the attenuated total reflection method. The resolution of the interference fringes can be tuned with the incident angles, because different BPP modes are excited in the metal-dielectric multilayers. The feature size as small as 34nm (about lambda/13) can be realized under the 436nm TM-polarized illumination, which is suitable for deep-subwavelength lithography. The exposure depth decreases with increasing the resonant angle. Electromagnetic simulations by a finite difference time-domain method on the two-dimensional and three-dimensional examples have been performed to validate the designs. (C) 2014 Elsevier GmbH. All rights reserved.
引用
收藏
页码：6158 / 6161
页数：4
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