One-dimensional angular-measurement-based stitching interferometry

被引:25
|
作者
Huang, Lei [1 ]
Xue, Junpeng [2 ]
Ga, Bo [3 ,4 ]
Idir, Mourad [1 ]
机构
[1] Brookhaven Natl Lab, Natl Synchrotron Light Source 2, Upton, NY 11973 USA
[2] Sichuan Univ, Sch Aeronaut & Astronaut, Chengdu 010065, Sichuan, Peoples R China
[3] Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201800, Peoples R China
[4] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
来源
OPTICS EXPRESS | 2018年 / 26卷 / 08期
关键词
OPTICS;
D O I
10.1364/OE.26.009882
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this work, we present. one-dimensional stitching interferometry based on the angular measurement for high-precision mirror metrology. The tilt error introduced by the stage motion during the stitching process is measured by an extra angular measurement device. The local profile measured by the interferometer in a single field of view is corrected using the measured angle before the piston adjustment in the stitching process. Comparing to the classical software stitching technique, the angle measuring stitching technique is more reliable and accurate in profiling mirror surface at the nanometer level. Experimental results demonstrate the feasibility of the proposed stitching technique. Based on our measurements, the typical repeatability within 200 mm scanning range is 0.5 nm RMS or less. (C) 2018 Optical Society of America
引用
收藏
页码:9882 / 9892
页数:11
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