Removal of Ion Implanted Resists with Various Acceleration Energy using Wet Ozone

被引：3
|
作者：
Goto, Yousuke [1 ]
Maruoka, Takeshi [1 ]
Yamamoto, Masashi [1 ]
Horibe, Hideo [1 ,3 ]
Kusano, Eiji [1 ]
Miura, Toshinori [2 ]
Kekura, Mituru [2 ]
Tagawa, Seiichi [3 ]
机构：
[1] Kanazawa Inst Technol, Res Lab Integrated Technol Syst, Haku San, Ishikawa 9240838, Japan
[2] Meidensha Corp, Core Technol Res & Dev Ctr, Shizuoka 4108588, Japan
[3] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2009年 / 22卷 / 03期
关键词：
resist; removal; wet ozone; acceleration energy; environment;
D O I：
10.2494/photopolymer.22.321
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
We investigated the removal of ion-implanted resists with various acceleration energy using wet ozone. The resist removal rate decreased with increasing acceleration energy in B- and P-ion-implanted resists. The hardness of ion-implanted resists increased with increasing acceleration energy as a result of nanoindentation, and was simulated by Stopping and Range f Ions in Matter software (SRIM2008).
引用
收藏
页码：321 / 324
页数：4
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