Nanoscopic evidence for dissociative adsorption of asymmetric disulfide self-assembled monolayers on Au(111)

被引:0
|
作者
Noh, J
Hara, M [1 ]
机构
[1] RIKEN, Inst Phys & Chem Res, Frontier Res System, Wako, Saitama 3510198, Japan
[2] Tokyo Inst Technol, Dept Elect Chem, Midori Ku, Yokohama, Kanagawa 2268502, Japan
关键词
D O I
10.1021/la991423l
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We have monitored the adsorption process of 11-hydroxyundecyl octadecyl disulfide (CH3(CH2)(17)SS(CH2)(11)OH, HUOD) self-assembled monolayers (SAMs) on the Au(lll) surface during the initial SAM growth stage using scanning tunneling microscopy (STM). STM imaging clearly exhibits two types of phase-separated domains having different corrugation periodicities which are consistent with the lengths of CH3(CH2)(17)S and HO(CH2)(11)S molecules, respectively. This is the first direct observation of the dissociative adsorption of disulfides on the nanometer scale. The self-assembly process of HUOD molecules physisorbed on graphite, on the other hand, is mainly governed by a hydrogen bond with a hydroxyl group facing another hydroxyl group of adjacent molecules without any S - S bond cleavage of the disulfide group unlike the adsorption process of HUOD molecules on gold. We have demonstrated a new and simple insightful method of comparing monolayers chemisorbed on Au(lll) with those physisorbed on graphite.
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页码:2045 / 2048
页数:4
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