Characterization and Analysis of Bit Errors in 3D TLC NAND Flash Memory

被引:18
|
作者
Papandreou, Nikolaos [1 ]
Pozidis, Haralampos [1 ]
Parnell, Thomas [1 ]
Ioannou, Nikolas [1 ]
Pletka, Roman [1 ]
Tomic, Sasa [1 ]
Breen, Patrick [2 ]
Tressler, Gary [2 ]
Fry, Aaron [3 ]
Fisher, Timothy [3 ]
机构
[1] IBM Res Zurich, Saumerstr 4, CH-8803 Ruschlikon, Switzerland
[2] IBM Syst, 2455 South Rd, Poughkeepsie, NY USA
[3] IBM Syst, 10777 Westheimer Rd, Houston, TX USA
关键词
3D NAND; flash memory; triple-level cell (TLC); endurance; threshold voltage;
D O I
10.1109/irps.2019.8720454
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
3D NAND flash memory has entered dynamically into the space of enterprise server and storage systems, offering significantly higher capacity and better endurance than the latest 2D technology node. Moreover, the advancements in vertical stacking, cell design and program/read algorithms, have also enabled TLC 3D NAND flash with enterprise-level reliability, thus achieving further increase in capacity and cost-per-bit reduction. This paper presents an in-depth analysis of the bit-error characteristics of state-of-the-art 64-layer 3D TLC NAND flash with a focus on read-voltage calibration. We provide experimental measurements of the RBER and threshold voltage distributions using typical and mixed-mode test patterns of program/erase cycling, retention and read-disturb. Moreover, we quantify the RBER components attributed to threshold voltage level overlapping and on-chip 2-step program errors. Finally, we characterize how the optimal read voltages change under different device stress and we evaluate calibration schemes with different performance and complexity trade-offs.
引用
收藏
页数:6
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