Magnetoresistance in cosputtered Cu-Ni-Fe films

被引：0
|
作者：
Chen, LH [1 ]
Jin, S [1 ]
Tiefel, TH [1 ]
机构：
[1] LUCENT TECHNOL BELL LABS,MURRAY HILL,NJ 07974
来源：
JOURNAL OF APPLIED PHYSICS | 1997年 / 81卷 / 08期
关键词：
D O I：
10.1063/1.365172
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4592 / 4592
页数：1
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