Particle-in-cell simulations of ion dynamics in a pinched-beam diode

被引:1
|
作者
Foster, J. C. [1 ]
McClory, J. W. [1 ]
Swanekamp, S. B. [2 ]
Hinshelwood, D. D. [2 ]
Richardson, A. S. [2 ]
Adamson, P. E. [2 ]
Schumer, J. W. [2 ]
James, R. W. [3 ]
Ottinger, P. F. [4 ]
Mosher, D. [4 ]
机构
[1] Air Force Inst Technol, Dayton, OH 45433 USA
[2] US Naval Res Lab, Washington, DC 20375 USA
[3] US Coast Guard Acad, New London, CT 06320 USA
[4] Syntek Technol, Fairfax, VA 22031 USA
关键词
CATHODE PLASMA; SPACE-CHARGE; ELECTRON; TRANSPORT; DISCHARGE; CURRENTS;
D O I
10.1063/5.0089904
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Particle-in-cell simulations of a 1.6 MV, 800 kA, and 50 ns pinched-beam diode have been completed with emphasis placed on the quality of the ion beams produced. Simulations show the formation of multiple regions in the electron beam flow characterized by locally high charge and current density ( "hot spots "). As ions flow through the electron-space-charge cloud, these hot spots electrostatically attract ions to produce a non-uniform ion current distribution. The length of the cavity extending beyond the anode-to-cathode gap (i.e., behind the cathode tip) influences both the number and amplitude of hot spots. A longer cavity length increases the number of hot spots yet significantly reduces the amplitude producing a smoother, more uniform ion beam than for shorter cavities. The net current and the ion bending angles are also significantly smaller with long cavities. Published under an exclusive license by AIP Publishing.
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页数:11
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