Self-assembled quantum dots (QDs) of highly strained InAlAs have been grown by molecular beam epitaxy in separate-confinement p-i-n heterostructures on (001) GaAs substrates. Results from a systematic study of samples with varying amounts of deposited material relates the observed emission peaks with QD levels, wetting layer states, or barrier materials. For samples with high-QD concentration, lasing is observed in the upper-QD shells. A sample with contact layers improving carrier and optical confinement operates up to room temperature and displays lowered threshold current densities. A threshold current density of similar to 4 A/cm(2) is measured for this structure at T = 5 K and continuous-wave operation is obtained up to T similar to 77 K. A material gain larger than 1.7 x 10(4) cm(-1) is measured for this single-layer structure. Lasing is observed in the upper-QD shells for small gain media, and progresses towards the QD lower states for longer cavity lengths representing an emission shift of 45 meV. A minor dependence of the threshold on QD density is found for samples having densities between 20 and hundreds of QDs per micron squared. For samples with multiple QD layers displaying vertical self-assembling, an increase in the emission linewidth is observed compared with single-layer samples and multilayer samples with uncorrelated growth. (C) 2000 American Institute of Physics. [S0021-8979(00)04803-9].
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Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Liang De-Chun
An Qi
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Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
An Qi
Jin Peng
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Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Jin Peng
Li Xin-Kun
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Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Li Xin-Kun
Wei Heng
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Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Wei Heng
Wu Ju
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Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Wu Ju
Wang Zhan-Guo
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Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
机构:
Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of SciencesKey Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences
金鹏
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李新坤
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魏恒
吴巨
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Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of SciencesKey Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences
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Fujitsu Lab Ltd, Kanagawa 2430197, Japan
Natl Inst Adv Ind Sci & Technol, Green Elect Collaborat Res Ctr, Tsukuba, Ibaraki 3058569, JapanFujitsu Lab Ltd, Kanagawa 2430197, Japan
Yokoyama, N.
Sugawara, M.
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QD Laser Inc, Kanagawa Ku, Kawasaki, Kanagawa 2100855, JapanFujitsu Lab Ltd, Kanagawa 2430197, Japan
Sugawara, M.
Arakawa, Y.
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Univ Tokyo, Inst Nanoquantum Informat Elect, Meguro Ku, Tokyo 1538094, Japan
Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538094, JapanFujitsu Lab Ltd, Kanagawa 2430197, Japan