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Defining Switching Efficiency of Multilevel Resistive Memory with PdO as an Example
被引:16
|作者:
Rao, K. D. M.
[1
,2
]
Sagade, Abhay A.
[1
,2
]
John, Robin
[3
,4
]
Pradeep, T.
[3
,4
]
Kulkarni, G. U.
[5
]
机构:
[1] Jawaharlal Nehru Ctr Adv Sci Res, Chem & Phys Mat Unit, Jakkur PO, Bangalore 560064, Karnataka, India
[2] Jawaharlal Nehru Ctr Adv Sci Res, Themat Unit Excellence Nanochem, Jakkur PO, Bangalore 560064, Karnataka, India
[3] Indian Inst Technol, DST Unit Nanosci, Chennai 600036, Tamil Nadu, India
[4] Indian Inst Technol, Themat Unit Excellence, Dept Chem, Chennai 600036, Tamil Nadu, India
[5] Ctr Nano & Soft Matter Sci, Bangalore 560013, Karnataka, India
来源:
关键词:
CELL;
D O I:
10.1002/aelm.201500286
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
Resistive random access memory (RRAM) is the most promising candidate for next generation nonvolatile memory. In this article, resistive switching in PdO thin film is investigated. The fabricated in-plane devices showed voltage pulse induced multilevel resistive switching (MRS) with as many as five states under ambient conditions with high degrees of retention and endurance. The I-V characteristics of the different memory states are linear and only a small reading voltage (approximate to 10 mV) is necessary. Raman mapping of PdO (B-1g mode, 650 cm(-1)) and temperature-dependent electrical transport measurements provide an insight into possible redox mechanism involving PdO/Pd particles. For the first time, the switching efficiency of a MRS device is uniquely defined in terms of a parameter called "multiplex number (M)," which is the sum of the total number of memory states and the ratio between the number of switching events observed in a device and the total number of possible switching events. The present PdO MRS device exhibits the highest M value compared to the values evaluated from the literature examples. Such high performance MRS in PdO devices makes them potential candidates for RRAM and neuromorphic circuit applications.
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