Ferromagnetism and spin polarization in indium nitride, indium oxynitride, and Cr substituted indium oxynitride films

被引:4
|
作者
Thapa, P. [1 ]
Lawes, G. [1 ]
Nadgorny, B. [1 ]
Naik, R. [1 ]
Sudakar, C. [1 ,2 ]
Schaff, W. J. [3 ]
Dixit, A. [1 ,4 ]
机构
[1] Wayne State Univ, Dept Phys & Astron, Detroit, MI 48201 USA
[2] Indian Inst Technol, Dept Phys, Madras 600036, Tamil Nadu, India
[3] Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA
[4] Indian Inst Technol Rajasthan, Dept Phys, Jodhpur 342001, Rajasthan, India
关键词
Indium oxide; Magnetism; Film; Semiconducting; Spin polarization; HETEROEPITAXIAL GROWTH; ANDREEV REFLECTION; INN FILMS;
D O I
10.1016/j.apsusc.2014.01.025
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated the structural, electrical, and magnetic properties of both sputter deposited indium oxynitride and Cr substituted indium oxynitride films as well as InN films grown by molecular beam epitaxy. The degenerate oxynitride films exhibit n-type carrier concentrations in excess of 10(20) cm(-3) and remain conducting to low temperatures, while the InN samples have much lower carrier concentrations and are insulating at low temperatures. At the same time all of these films show a room temperature ferromagnetic signal, with saturation magnetization ranging from 0.05 emu cm(-3) for the indium oxynitride and InN films to 0.30 emu cm(-3) for the Cr substituted film. Low temperature point contact Andreev reflection measurements find a spin polarizations from 46 +/- 2% for indium oxynitride to 50 +/- 2% for the Cr substituted films. These results highlight the potential of nitrides for spintronic applications. (C) 2014 Elsevier B. V. All rights reserved.
引用
收藏
页码:189 / 193
页数:5
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