Characterization of thin films containing zirconium, oxygen, and sulfur by scanning electron and atomic force microscopy

Oxidic zirconium films prepared by chemical deposition from aqueous medium on sulfonic acid terminated self-assembled monolayers attached to an oxidized silicon surface were investigated with scanning electron microscopy and atomic force microscopy. Bulk precipitate forms in the 4 mM Zr(SO4)(2) . 4H(2)O, 0.4 N HCl deposition medium at 343 K after approximately 30 min. Precipitate particles (200 nm and larger) were found embedded in the oxidic zirconium film and adsorbed on top of the film; they could be washed off, but patches of the film were removed. Working with unstable deposition solutions, in which homogeneous nucleation occurs, leads to preparation-inherent flaws in the film.