In-Line Inspection on Thickness of Sputtered Thin Ta and TaN Films by Spectroscopic Ellipsometry

被引：1
|
作者：
Yuan, Chao [1 ]
Kang, Xiaoxu [1 ]
Zuo, Qingyun [1 ]
Zeng, Shaohai [1 ]
Chen, Shoumian [1 ]
Zhao, Yuhang [1 ]
机构：
[1] Shanghai IC R&D Ctr, Proc Technol Dept, Shanghai 201210, Peoples R China
来源：
CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2012 (CSTIC 2012) | 2012年 / 44卷 / 01期
关键词：
D O I：
10.1149/1.3694435
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
An optical method utilizes spectroscopic and ellipsometry(SE) technique is developed to measure thin metal thickness below 300A. Repeated tests have been made on various TaN or Ta films to check the stability. Sheet resistance of the films has been measured by four-point probe to check the correlation. TEM analysis has been made to check the accuracy of the measurement. The results match well with TEM and show good repeatability and reproducibility(R&R) performance for 100A and 200A Ta or TaN film deposited directly on silicon substrate, which indicates the possibility for the process monitor of thin metal films.
引用
收藏
页码：1103 / 1110
页数：8
相关论文
共 50 条
  • [1] In-line inspection on thickness of sputtered HfO2 and Hf metal ultra-thin films by spectroscopic ellipsometry
    Chuo, Y
    Shu, DY
    Lee, LS
    Hsieh, WY
    Tsai, MJ
    Wang, A
    Hung, SB
    Tzeng, PJ
    Chou, YW
    [J]. 2004 SEMICONDUCTOR MANUFACTURING TECHNOLOGY WORKSHOP PROCEEDINGS, 2004, : 119 - 122
  • [2] In-line measurement of epitaxial silicon-germanium thin films by spectroscopic ellipsometry
    Liaw, HM
    Ygartua, C
    [J]. PROCEEDINGS OF THE ELECTROCHEMICAL SOCIETY SYMPOSIUM ON DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS AND DEVICES, 1997, 97 (12): : 160 - 170
  • [3] Spectroscopic ellipsometry study of thin diffusion barriers of TaN and Ta for Cu interconnects in integrated circuits
    Rudra, S.
    Waechtler, T.
    Friedrich, M.
    Louis, S. J.
    Himcinschi, C.
    Zimmermann, S.
    Schulz, S. E.
    Silaghi, S.
    Cobet, C.
    Esser, N.
    Gessner, T.
    Zahn, D. R. T.
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2008, 205 (04): : 922 - 926
  • [4] Spectroscopic ellipsometry and Raman studies on sputtered TiO2 thin films
    Karunagaran, B
    Kim, YK
    Kim, K
    Dhungel, SK
    Yoo, JS
    Mangalaraj, D
    Yi, J
    [J]. FROM NANOPOWDERS TO FUNCTIONAL MATERIALS, 2005, 106 : 127 - 132
  • [5] In-situ growth studies of sputtered YBCO thin films by spectroscopic ellipsometry
    Bijlsma, ME
    Blank, DHA
    Wormeester, H
    vanSilfhout, A
    Rogalla, H
    [J]. JOURNAL OF ALLOYS AND COMPOUNDS, 1997, 251 (1-2) : 15 - 18
  • [6] Optical characterization of sputtered amorphous aluminum nitride thin films by spectroscopic ellipsometry
    Khoshman, JM
    Kordesch, ME
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 2005, 351 (40-42) : 3334 - 3340
  • [7] Spectroscopic ellipsometry for in-line monitoring of silicon nitrides
    Cook, CS
    Daly, T
    Liu, R
    Canonico, M
    Xie, Q
    Gregory, RB
    Zollner, S
    [J]. THIN SOLID FILMS, 2004, 455 : 794 - 797
  • [8] A spectroscopic ellipsometry investigation of RF-sputtered crystalline vanadium pentoxide thin films
    Oukassi, S.
    Gagnard, X.
    Salot, R.
    Zahorski, D.
    Stehle, J. L.
    Piel, J. P.
    Pereira-Ramos, J. P.
    [J]. PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 5, 2008, 5 (05): : 1109 - +
  • [9] Vacuum ultra-violet spectroscopic ellipsometry study of sputtered BeZnO thin films
    Khoshman, Jebreel M.
    Kordesch, Martin E.
    [J]. OPTIK, 2011, 122 (22): : 2050 - 2054
  • [10] Analysis of thickness-dependent electron transport in magnetron sputtered ZrN films by spectroscopic ellipsometry
    Bulir, Jiri
    More-Chevalier, Joris
    Chertopalov, Sergii
    Fekete, Ladislav
    Volfova, Lenka
    Hubik, Pavel
    Novotny, Michal
    Lancok, Jan
    [J]. THIN SOLID FILMS, 2021, 731
12345