Epitaxial Ferroelectric La-Doped Hf0.5Zr0.5O2 Thin Films

被引:54
|
作者
Song, Tingfeng [1 ]
Bachelet, Romain [2 ]
Saint-Girons, Guillaume [2 ]
Solanas, Raul [1 ]
Fina, Ignasi [1 ]
Sanchez, Florencio [1 ]
机构
[1] Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, Spain
[2] Univ Lyon, Ecole Cent Lyon, Inst Nanotechnol Lyon INL, CNRS UMR 5270, F-69134 Ecully, France
来源
ACS APPLIED ELECTRONIC MATERIALS | 2020年 / 2卷 / 10期
关键词
ferroelectric HfO2; ferroelectric oxides; Hf0.5Zr0.5O2; epitaxial HfO2; epitaxial oxides on silicon; HAFNIUM OXIDE; FIELD; POLARIZATION; ENDURANCE; FATIGUE; MECHANISM; GROWTH;
D O I
10.1021/acsaelm.0c00560
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Doping ferroelectric Hf0.5Zr0.5O2 with La is a promising route to improve endurance. However, the beneficial effect of La on the endurance of polycrystalline films may be accompanied by degradation of retention. We have investigated the endurance-retention dilemma in La-doped epitaxial films. Compared to undoped epitaxial films, large values of polarization are obtained in a wider thickness range, whereas the coercive fields are similar, and the leakage current is substantially reduced. Compared to polycrystalline La-doped films, epitaxial La-doped films show more fatigue, but there is no significant wake-up effect and endurance-retention dilemma. The persistent wake-up effect, common to polycrystalline La-doped Hf0.5Zr0.5O2 films, is limited to a few cycles in epitaxial films. Despite fatigue, endurance in epitaxial La-doped films is more than 10(10) cycles, and this good property is accompanied by excellent retention of more than 10 years. These results demonstrate that the wake-up effect and endurance-retention dilemma are not intrinsic in La-doped Hf0.5Zr0.5O2.
引用
收藏
页码:3221 / 3232
页数:12
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