High-aspect-ratio nanoporous membranes made by reactive ion etching and e-beam and interference lithography

被引：3
|
作者：
Divan, Ralu [1 ]
Makarova, Olga V. [2 ]
Skoog, Shelby [3 ,4 ]
Narayan, Roger [3 ,4 ]
Sumant, Anirudha V. [1 ]
Tang, Cha-Mei [5 ]
Moldovan, Nicolaie [6 ]
机构：
[1] Argonne Natl Lab, Ctr Nanoscale Mat, Argonne, IL 60439 USA
[2] Creatv MicroTech Inc, Chicago, IL USA
[3] Univ N Carolina, Joint Dept Biomed Engn, Raleigh, NC 27695 USA
[4] N Carolina State Univ, Raleigh, NC 27695 USA
[5] Creatv MicroTech Inc, Potomac, MD 20854 USA
[6] Adv Diamond Technol Inc, Romeoville, IL 60446 USA
来源：
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2014年 / 20卷 / 10-11期
基金：
美国国家科学基金会;
关键词：
DIAMOND THIN-FILMS; UV-PHOTORESIST; FABRICATION; MICROSIEVES; SU-8;
D O I：
10.1007/s00542-013-1932-7
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Nanoporous membranes engineered to mimic natural filtration systems can be used in "smart" implantable drug delivery systems, hemodialysis membranes, bio-artificial organs, and other novel nano-enabled medical devices. Conventional membranes exhibit several limitations, including broad pore size distributions and low pore densities. To overcome these problems, lithographic approaches were used to develop porous silicon, silicon nitride, ultrananocrystalline diamond (UNCD), and polymer film membranes. Here we report processing of high porosity, high-aspect-ratio membranes by two techniques: UNCD fabricated by reactive ion etching after e-beam lithography and epoxy fabricated by interference lithography.
引用
收藏
页码：1797 / 1802
页数：6
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