Exploration of the inherent magnetoresistance in InSb thin films

被引:4
|
作者
Zhang, Tong
Harris, J. J.
Branford, W. R.
Clowes, S. K.
Cohen, L. F.
Solin, S. A.
机构
[1] Univ London Imperial Coll Sci Technol & Med, Blackett Lab, London SW7 2BW, England
[2] Washington Univ, Dept Phys, St Louis, MO 63141 USA
[3] Washington Univ, Ctr Mat Innovat, St Louis, MO 63141 USA
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1088/0268-1242/21/12/007
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The depth-dependent electrical properties of InSb thin films grown on GaAs substrates result in an inherent magnetoresistance in the layers. For certain applications it is important to be able to manipulate this effect controllably. This paper demonstrates both experimentally and theoretically that the magnitude of the magnetoresistance can be dramatically changed by epilayer design. We show that the inclusion of a doped region in part of the layer structure allows the inherent magnetoresistance to be changed by a factor of 40.
引用
收藏
页码:1543 / 1546
页数:4
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