Functional epoxy polymer for direct nano-imprinting of micro-optical elements

被引：6

作者：

Fader, R. ^{[1
,3
]}

Landwehr, J. ^{[1
]}

Rumler, M. ^{[1
,2
,3
]}

Rommel, M. ^{[1
]}

Bauer, A. J. ^{[1
,3
]}

Frey, L. ^{[1
,2
,3
]}

Voelkel, R. ^{[4
]}

Brehm, M. ^{[5
]}

Kraft, A. ^{[5
]}

机构：

[1] Fraunhofer Inst Integrated Syst & Device Technol, D-91058 Erlangen, Germany

[2] Univ Erlangen Nurnberg, Chair Electron Devices, D-91058 Erlangen, Germany

[3] Erlangen Grad Sch Adv Opt Technol SAOT, D-91058 Erlangen, Germany

[4] SUSS MicroOpt Lithog SA, CH-2000 Neuchatel, Switzerland

[5] DELO Ind Adhes, D-86949 Windach, Germany

来源：

MICROELECTRONIC ENGINEERING | 2013年 / 110卷

关键词：

SCIL; UV polymers; Soft imprint lithography; TiO2; nanoparticles; Refractive index matching; LITHOGRAPHY;

D O I：

10.1016/j.mee.2013.02.030

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This work presents a functional resist for the direct fabrication of micro-optical elements with UV-enhanced substrate conformal imprint lithography (UV-SCIL). This functional resist is based on a UV-curable epoxy polymer where TiO2 nanoparticles are enclosed. Adding these particles to the polymer raises the refractive index of the functional resist with raising particle content from 1.52 up to 1.64 at a wave-length of 633 nm. Therefore, the refractive index can be matched for many micro-optical applications. Here, multilevel Fresnel lenses from a 200 mm silica substrate are transferred into the functional resist by UV-SCIL with nanometer resolution and high structure fidelity. (C) 2013 Elsevier B.V. All rights reserved.

引用

页码：90 / 93

页数：4

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