Stress in femtosecond-laser-written waveguides in fused silica

被引：96
|
作者：
Bhardwaj, VR
Corkum, PB
Rayner, DM
Hnatovsky, C
Simova, E
Taylor, RS
机构：
[1] Natl Res Council Canada, Steacie Inst Mol Sci, Ottawa, ON K1A 0R6, Canada
[2] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
来源：
OPTICS LETTERS | 2004年 / 29卷 / 12期
关键词：
D O I：
10.1364/OL.29.001312
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We identify two states of stress induced in waveguides fabricated by femtosecond lasers in fused silica and show how they can be relieved by annealing. In-plane stress and stress concentration are revealed through birefringence and loss measurements. Another kind of laser-induced stress appears in the form of swelling of the glass surface when waveguides are written near the surface and is a manifestation of confined rapid material quenching. By annealing the sample we reduce the losses by similar to30% (at 633 nm) and decrease the birefringence by a factor of 4 in fused silica. (C) 2004 Optical Society of America.
引用
收藏
页码：1312 / 1314
页数：3
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