The effect of active species during TiN thin film deposition by the cathodic cage plasma process

Thin solid films of titanium nitride were grown on glass using the cathodic cage plasma deposition technique. The plasma atmosphere used was a mixture of Ar, N-2 and H-2. The H-2 amount in the mixture was 0, 12.5 and 22.5%. The deposition process was monitored by Optical Emission Spectroscopy in order to determine the effect of active species in plasma on deposited film characteristics. The maximum luminous intensity of the Ha species was observed at 12.5% of H-2 gas content, but decreased when H-2 gas content was increased to 22.5%. This trend strongly affected the crystalline structure, optical properties and topography of the TiN film. Grown films were composed by nano-size TiN particles and contained various amount of nitrogen into the crystal. The film deposited in a plasma atmosphere without H-2 gas had the highest transmittance. The film obtained a plasma atmosphere containing 12.5% of H-2 had the lowest transmittance, the highest homogeneity and stoichiometry.