A Coaxial Dielectric Barrier Discharge Reactor for Treatment of Winter Wheat Seeds

被引:29
|
作者
Nishime, Thalita M. C. [1 ]
Wannicke, Nicola [1 ]
Horn, Stefan [1 ]
Weltmann, Klaus-Dieter [1 ]
Brust, Henrike [1 ]
机构
[1] Leibniz Inst Plasma Sci & Technol INP, D-17489 Greifswald, Germany
来源
APPLIED SCIENCES-BASEL | 2020年 / 10卷 / 20期
关键词
plasma agriculture; DBD; wheat; germination acceleration; seed; cold atmospheric plasma (CAP); plasma source; ATMOSPHERIC-PRESSURE PLASMA; COLD-PLASMA; SEEDLING GROWTH; PLANT-GROWTH; GERMINATION; ENHANCEMENT; MICROORGANISMS; INACTIVATION;
D O I
10.3390/app10207133
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Non-thermal atmospheric pressure plasmas have been recently explored for their potential usage in agricultural applications as an interesting alternative solution for a potential increase in food production with a minor impact on the ecosystem. However, the adjustment and optimization of plasma sources for agricultural applications in general is an important study that is commonly overlooked. Thus, in the present work, a dielectric barrier discharge (DBD) reactor with coaxial geometry designed for the direct treatment of seeds is presented and investigated. To ensure reproducible and homogeneous treatment results, the reactor mechanically shakes the seeds during treatment, and ambient air is admixed while the discharge runs. The DBD, operating with argon and helium, produces two different chemically active states of the system for seed modification. The temperature evolution was monitored to guarantee a safe manipulation of seeds, whereas a physiological temperature was assured by controlling the exposure time. Both treatments led to a remarkable increase in wettability and acceleration in germination. The present study showed faster germination acceleration (60% faster after 24 h) and a lower water contact angle (WCA) (82% reduction) for winter wheat seeds by using the described argon discharge (with air impurities). Furthermore, the treatment can be easily optimized by adjusting the electrical parameters.
引用
收藏
页码:1 / 19
页数:19
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