Nanoscale surface tracking of laser material processing using phase shifting diffraction interferometry

被引：9

作者：

Guss, Gabriel M. ^{[1
]}

Sridharan, Arun K. ^{[2
]}

Elhadj, Selim ^{[1
]}

Johnson, Michael A. ^{[1
]}

Matthews, Manyalibo J. ^{[1
]}

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 95520 USA

[2] Gen Elect, John F Welch Technol Ctr, Bangalore 560048, Karnataka, India

来源：

OPTICS EXPRESS | 2014年 / 22卷 / 12期

关键词：

FUSED-SILICA; DAMAGE; RELAXATION; OPTICS;

D O I：

10.1364/OE.22.014493

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Phase shifting diffraction interferometry (PSDI) was adapted to provide real-time feedback control of a laser-based chemical vapor deposition (LCVD) process with nanometer scale sensitivity. PSDI measurements of laser heated BK7 and fused silica substrates were used to validate a finite element model that accounts for both refractive index changes and displacement contributions to the material response. Utilizing PSDI and accounting for the kinetics of the modeled thermomechanical response, increased control of the LCVD process was obtained. This approach to surface tracking is useful in applications where extreme environments on the working surface require back-side optical probing through the substrate. (C) 2014 Optical Society of America

引用

页码：14493 / 14504

页数：12

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