Negative-index materials: Two approaches for nanofabricated metamaterials

被引：3
|
作者：
Huebner, Uwe [1 ]
Petschulat, Joerg [2 ]
Pshenay-Severin, Ekaterina [2 ]
Chipouline, Arkadi [2 ]
Pertsch, Thomas [2 ]
Rockstuhl, Carsten [3 ]
Lederer, Falk [3 ]
机构：
[1] IPHT, D-07745 Jena, Germany
[2] Univ Jena, Ctr Innovat Competence, D-07743 Jena, Germany
[3] Univ Jena, Inst Condensed Matter Theory & Solid State Opt, D-07743 Jena, Germany
来源：
MICROELECTRONIC ENGINEERING | 2009年 / 86卷 / 4-6期
关键词：
Metamaterial; Negative-index materials; Subwavelength gratings; Electron beam lithography; Metal deposition; Lift-off; WAVELENGTHS;
D O I：
10.1016/j.mee.2009.01.064
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this work we present results on the practical realization of optical negative-index metamaterials based on two different geometries for the visible and near infrared (NIR) domains. A detailed description of the manufacturing technology used for the production of the negative-index materials is presented. The produced sample based on the cut-wire geometry has a refractive index of n = -0.65 + 1.6i at the wavelength of 2.1 mu m. (c) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码：1138 / 1141
页数：4
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