Influence of Pulsed Gas Feeding on Surface Defects and Mechanical Properties of Ti/TiN Multilayered Films deposited by Ion Beam Assisted Magnetron Sputtering

被引：0
|
作者：
Fu Zhiqiang [1 ]
Ren Yi [1 ]
Wang Chengbiao [1 ]
Yue Wen [1 ]
Lin Songsheng [2 ]
机构：
[1] China Univ Geosci, Sch Engn & Technol, Beijing 100083, Peoples R China
[2] Guangzhou Res Inst Non ferrous Met, Guangzhou 510651, Peoples R China
来源：
MATERIALS SCIENCE, CIVIL ENGINEERING AND ARCHITECTURE SCIENCE, MECHANICAL ENGINEERING AND MANUFACTURING TECHNOLOGY, PTS 1 AND 2 | 2014年 / 488-489卷
基金：
中国国家自然科学基金; 对外科技合作项目（国际科技项目）;
关键词：
Ti/TIN multilayered films; ion beam assisted magnetron spputtering; pulsed gas feeding; surface defect; mechanical properties; THIN-FILMS; TIN; HARDNESS;
D O I：
10.4028/www.scientific.net/AMM.488-489.48
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The influence of sputtering power, N-2 flow rate, ion current and substrate temperature on the monolayer TiN films deposited by ion beam assisted magnetron sputtering and the effect of the on-off ratio and deposition period on the multilayered Ti/TiN films was studied. It was found that the key factors affecting surface defects of monolayer TiN films are sputtering power and N2 flow rate while ion current is the most significant factor affecting the hardness of monolayer TiN films. The surface defects can be greatly inhibited by pulsed gas feeding. The adhesion and hardness of the multilayered Ti/TiN films is improved with increasing on-off ratio or decreasing deposition period; the on-off ratio has a negligible effect on the surface defects of the multilayered Ti/TiN films while the surface defects of the multilayered Ti/TiN films become more obvious at a long deposition period.
引用
收藏
页码：48 / +
页数：2
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