Magnetic and structural properties of MnBi multilayered thin films

被引：32
|
作者：
Hozumi, T. [1 ,2 ]
LeClair, P. [1 ]
Mankey, G. [1 ]
Mewes, C. [1 ]
Sepehri-Amin, H. [3 ]
Hono, K. [3 ]
Suzuki, T. [1 ]
机构：
[1] Univ Alabama, Ctr Mat Informat Technol, Tuscaloosa, AL 35487 USA
[2] TDK Corp, Adv Technol Dev Ctr, Narita 2868588, Japan
[3] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
来源：
JOURNAL OF APPLIED PHYSICS | 2014年 / 115卷 / 17期
基金：
美国国家科学基金会;
关键词：
D O I：
10.1063/1.4867127
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Magnetic and structural properties of MnBi films with thicknesses up to 50 nm were investigated. Thin films of the MnBi LTP (Low Temperature Phase) were fabricated onto silica-glass substrates by sputter-deposition of Bi/Mn multilayer, followed by a subsequent annealing at about 550 degrees C for 30 min. Coercivity of such thin films is higher than 15 kOe, even though the film thickness is about 10 nm. These thin films show the preferential growth of c-axis of the LTP along the film normal. Moreover, high resolution transmission electron microscopy indicates that the LTP regions of 30-50 nm in size are physically isolated by Bi. The magnetization reversal mechanism of such a LTP region is mainly governed by a coherent rotation mode based on the delta M curve measurement. (C) 2014 AIP Publishing LLC.
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页数：3
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