Precisely Patterned Growth of Ultra-Long Single-Crystalline Organic Microwire Arrays for Near-Infrared Photodetectors

Owing to extraordinary properties, smalt-molecule organic micro/nanocrystals are identified to be prospective system to construct new-generation organic electronic and optoelectronic devices. Alignment and patterning of organic micro/nanocrystals at desired locations are prerequisite for their device applications in practice. Though various methods have been developed to control their directional growth and alignment, high-throughput precise positioning and patterning of the organic micro/nanocrystals at desired locations remains a challenge. Here, we report a photoresist-assisted evaporation method for large-area growth of precisely positioned ultralong methyl-squarylium (MeSq) microwire (MW) arrays. Positions as well as alignment densities of the MWs can be precisely controlled with the aid of the photoresist-template that fabricated by photolithography process. This strategy enables large-scale fabrication of organic MW arrays with nearly the same accuracy, uniformity, and reliability as photolithography. Near-infrared (NIR) photodetectors based on the MeSq MW arrays show excellent photoresponse behavior and are capable of detecting 808 nm light with high stability and reproducibility. The high on/off ratio of 1600 is significantly better than other organic nanostructure-based optical switchers. More importantly, this strategy can be readily extended to other organic molecules,: revealing the great potential of photoresist-assisted evaporation method for future high-performance organic optoelectronic devices.