Silicide formation and particle size growth in high-temperature-annealed, self-assembled FePt nanoparticles

被引:27
|
作者
Thomson, T
Terris, BD
Toney, MF
Raoux, S
Baglin, JEE
Lee, SL
Sun, S
机构
[1] Hitachi San Jose Res Ctr, San Jose, CA 95120 USA
[2] SLAC, Stanford Synchrotron Radiat Lab, Menlo Pk, CA 90250 USA
[3] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
[4] Univ St Andrews, Sch Phys & Astron, St Andrews, Fife, Scotland
[5] IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
D O I
10.1063/1.1667802
中图分类号
O59 [应用物理学];
学科分类号
摘要
L1(0) FePt nanoparticle assemblies consisting of a few layers of 4-nm-diameter particles, are a potential data storage medium beyond 1 Tbit/in(2). However, annealing at temperatures >500 degreesC is required to form the high anisotropy L1(0) phase. Recent studies have shown a substantial drop in magnetization for T-anneal>650 degreesC. We show that this reduction in magnetization is due to silicide formation as a result of a chemical reaction with the native oxide or Si substrate. We also show that full L1(0) ordering is established only after annealing at 725 degreesC for 60 min and note that particle agglomeration occurs under these conditions. (C) 2004 American Institute of Physics.
引用
收藏
页码:6738 / 6740
页数:3
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