A theoretical study of coverage effects for ethylene epoxidation on Cu(111) under low oxygen pressure

被引:40
|
作者
Torres, Daniel
Lopez, Nuria
Illas, Francesc
机构
[1] Univ Barcelona, Dept Quim Fis, E-08028 Barcelona, Spain
[2] Univ Barcelona, CeRQT, E-08028 Barcelona, Spain
[3] Univ Rovira & Virgili, Inst Chem Res Catalonia ICIQ, Dept Quim Fis & Inorgan, Tarragona 43007, Spain
关键词
epoxidation; ethene; Cu; selectivity; partial oxidation;
D O I
10.1016/j.jcat.2006.08.011
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The effect of oxygen coverage on the molecular mechanism of ethylene epoxidation on Cu(111) under ultra-high-vacuum conditions was studied by means of periodic density functional calculations. Oxygen coverages of 1/16 and 1/4 monolayer were considered. The results indicate that the barriers leading to ethylene oxide and acetaldehyde from a common oxametallacycle intermediate depend on the oxygen coverage. In particular, the decrease in the energy barrier leading to the epoxide with oxygen coverage can be correlated with a concomitant change in the formation energy of the desired product. It is also suggested that the optimum oxygen coverage for the epoxidation of a given olefin on Cu surfaces likely vary from one molecule to the other. (c) 2006 Elsevier Inc. All rights reserved.
引用
收藏
页码:404 / 409
页数:6
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