PULSED LASER MICRO POLISHING OF MICROFABRICATED NICKEL AND TI6AL4V SAMPLES

被引:0
|
作者
Perry, Tyler L. [1 ]
Werschmoeller, Dirk [1 ]
Li, Xiaochun [1 ]
Pfefferkorn, Frank E. [1 ]
Duffie, Neil A. [1 ]
机构
[1] Univ Wisconsin, Dept Mech Engn, Madison, WI 53706 USA
关键词
SURFACE-ROUGHNESS; FILMS; PLANARIZATION;
D O I
暂无
中图分类号
Q81 [生物工程学(生物技术)]; Q93 [微生物学];
学科分类号
071005 ; 0836 ; 090102 ; 100705 ;
摘要
The objective of this work is to improve our understanding of pulsed laser micro polishing (PL mu P) by studying the effects of laser pulse length, pulses per mm, and workpiece material on surface roughness. PL mu P experiments are conducted with a multi-mode Nd:YAG laser (1064 run wavelength) that is focused down to approximately 50 mu m diameter and scanned over the stationary workpiece Surface. Simulation results presented here and previous work Suggest that longer laser pulses are better for polishing. Results on microfabricated nickel samples using laser pulse lengths of 300 ns and 650 ns test this hypothesis. Additionally, a Surface artifact introduced by the PL mu P process will be investigated. Results on the microfabricated nickel sample prove that longer laser pulses yield a higher reduction in surface roughness; 300 ns and 650 ns pulses reduce the R, of the sample by 30% and 50%, respectively. The artifact introduced by the PL mu P is found to be directly related to the number of laser pulses per mm. Successful polishing is achieved on Ti6Al4V and the surface roughness (R(a)) of the sample Is reduced from 0.250 mu m to 0.058 mu m. It is also shown that the presence of argon shielding gas is necessary to avoid surface cracks. The results presented here further validate the simplified thermal and fluid flow modeling of the PL mu P process and demonstrate the effectiveness of PL mu P on a broadly used titanium alloy, Ti6Al4V.
引用
收藏
页码:329 / 339
页数:11
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