Electronic excitation effects on radiation damage in insulators under ion irradiation

被引:5
|
作者
Kishimoto, N
Okubo, N
Plaksin, OA
Takeda, Y
机构
[1] Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050003, Japan
[2] Univ Tsukuba, Tsukuba, Ibaraki 3058573, Japan
[3] AI Leypunsky Inst Phys & Power Engn, SSC, RF, Obninsk 249033, Russia
关键词
D O I
10.1016/j.jnucmat.2004.04.132
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
To extract electronic excitation effects from the synergistic damage processes, we have studied photon-irradiation effects on insulators under heavy ion irradiation. Copper ions (Cu2+) of 3 MeV energy at an ion flux of 2 muA/cm(2) and 2.3 eV photons at 0.2 J/cm(2) pulse were used to amorphous SiO2 (KU-1) and spinel MgO.2.4(Al2O3), either sequentially or simultaneously to fluences up to 5 x 10(17) ions/cm(2). Atomic force microscopy and cross-sectional TEM were conducted to study the surface morphology and internal microstructure, respectively. The simultaneous photon irradiation at high photon densities significantly enhanced surface damage for the insulators, but alleviated bulk defects. The electronic excitation gave rise to significant reduction in dislocation loops in MgO.2.4(Al2O3), whereas single ion irradiation produced copious dislocation loops. The results demonstrate that intense electronic excitation, coexistent with heavy ions, excite transient sub-gap states and the absorbed energy results in enhancement of atomic migration, either damaging the surface or annealing the internal defects. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:1048 / 1052
页数:5
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