Layout post processing in the ion projection lithography (IPL)

被引：1
|
作者：
Hartmann, H [1 ]
Petraschenko, A [1 ]
Schunk, S [1 ]
Steinmetz, R [1 ]
Haugeneder, E [1 ]
Löschner, H [1 ]
机构：
[1] Aiss GmbH, Vienna, Austria
来源：
16TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS | 2000年 / 3996卷
关键词：
D O I：
10.1117/12.377097
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
引用
收藏
页码：105 / 107
页数：3
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