Enhancing the stability of copper chromite catalysts for the selective hydrogenation of furfural using ALD overcoating

被引：64
|
作者：
Zhang, Hongbo [1 ]
Lei, Yu [2 ]
Kropf, A. Jeremy [1 ]
Zhang, Guanghui [1 ]
Elam, Jeffrey W. [2 ]
Miller, Jeffrey T. [1 ]
Sollberger, Fred [3 ]
Ribeiro, Fabio [3 ]
Akatay, M. Cem [4 ]
Stach, Eric A. [5 ]
Dumesic, James A. [6 ]
Marshall, Christopher L. [1 ]
机构：
[1] Argonne Natl Lab, Chem Sci & Engn Div, Argonne, IL 60439 USA
[2] Argonne Natl Lab, Div Energy Syst, Argonne, IL 60439 USA
[3] Purdue Univ, Sch Chem Engn, FRNY 2158, W Lafayette, IN 47907 USA
[4] Purdue Univ, Nanotechnol Ctr, W Lafayette, IN 47907 USA
[5] Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA
[6] Univ Wisconsin, Dept Chem & Biol Engn, Madison, WI 53706 USA
来源：
JOURNAL OF CATALYSIS | 2014年 / 317卷
关键词：
Selective hydrogenation; 2-Furfuraldehyde; Furfuryl alcohol; Stability; Copper chromite; TPR; XAFS; ALD; Operando; ATOMIC LAYER DEPOSITION; CARBON-SUPPORTED COPPER; STABILIZATION; REDUCTION; OXIDATION; DEHYDROGENATION; NANOPARTICLES; SPECTROSCOPY; CU-ZSM-5; ALCOHOL;
D O I：
10.1016/j.jcat.2014.07.007
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The stability of a gas-phase furfural hydrogenation catalyst (CuCr2O4 center dot CuO) was enhanced by depositing a thin Al2O3 layer using atomic layer deposition (ALD). Based on temperature-programed reduction (TPR) measurements, the reduction temperature of Cu was raised significantly, and the activation energy for furfural reduction was decreased following the ALD treatment. Thinner ALD layers yielded higher furfural hydrogenation activities. X-ray absorption fine structure (XAFS) spectroscopy studies indicated that Cu1+/Cu-0 are the active species for furfural reduction. (c) 2014 Elsevier Inc. All rights reserved.
引用
收藏
页码：284 / 292
页数：9
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