Field Emission from carbon films grown by the cathodic arc process

被引：4
|
作者：
Milne, WI [1 ]
Robertson, J [1 ]
Satyanarayana, BS [1 ]
Hart, A [1 ]
机构：
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
来源：
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2000年 / 14卷 / 2-3期
关键词：
D O I：
10.1142/S0217979200000303
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
By using the cathodic vacuum are deposition process, carbon films with variable sp(3)/sp(2) bonding ratio can be deposited on a variety of substrates at room temperature. The morphology of the films on be varied hom the mirror like smooth tetrahedrally bonded carbon (ta-C) films through nanocluster to fibrous type carbon by altering the deposition parameters. This piper reviews the work carried out on Field Emission from such carbon films and compares the results with thew on nanocluster films prepared using supersonic cluster beams. Threshold fields as low as 1 V/mu m with emission site densities of up to 10(4)-10(5)/cm(2) have been obtained.
引用
收藏
页码：301 / 307
页数：7
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