Analysis of the temperature dependence of current gain in heterojunction bipolar transistors

被引:12
|
作者
Ng, CMS
Houston, PA
Yow, HK
机构
[1] Department of Electronic and Electrical Engineering, University of Sheffield
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1109/16.554786
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An analytical description is developed which highlights the important physical parameters influencing the temperature dependence of the current gain in heterojunction bipolar transistors (HBT's). Each of the possible base current components is discussed and its relative importance to temperature dependence is assessed. The manifold nature of the contributions explains the widely different conditions under which negative differential resistance has been previously reported. Space charge region recombination is found to be the main contribution to temperature variation of current gain at low current densities. Factors affecting modern highly doped base devices at high current densities and elevated temperatures are reverse hole injection and base bulk recombination.
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页码:17 / 24
页数:8
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