Fabrication of silicon nanopillars using self-organized gold-chromium mask

被引：27
|
作者：
Ovchinnikov, V [1 ]
Malinin, A [1 ]
Novikov, S [1 ]
Tuovinen, C [1 ]
机构：
[1] Aalto Univ, Dept Elect & Commun Engn, Elect Phys Lab, FIN-02015 Helsinki, Finland
来源：
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2000年 / 69卷
关键词：
nanostructures; self-organized mask; nanopillars; plasma etch; silicon;
D O I：
10.1016/S0921-5107(99)00244-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this paper we present a fabrication process for nanometer scale silicon pillars. High aspect ratio and smooth sidewalls of the pillars are obtained by reactive ion etching of self-organized gold-chromium masked silicon. After annealing, a thin Au/Cr film is converted to the disordered array of metal particles. The particle diameter and density could be controlled by varying the thickness of the films. A set of experiments in fluorine based plasmas has been carried out in order to investigate the processing of silicon quantum pillars. The results show that the mask has a low speed of erosion. Sidewall evolution during low rf power etching has been analyzed. The process parameters for realizing high-anisotropy pillars of different shapes have been found. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：459 / 463
页数：5
相关论文
共 50 条
  • [1] Silicon nanopillars formed by reactive ion etching using a self-organized gold mask
    Ovchinnikov, V
    Malinin, A
    Novikov, S
    Tuovinen, C
    [J]. PHYSICA SCRIPTA, 1999, T79 : 263 - 265
  • [2] Fabrication of nanohole array on Si using self-organized porous alumina mask
    Shingubara, S
    Okino, O
    Murakami, Y
    Sakaue, H
    Takahagi, T
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (05): : 1901 - 1904
  • [3] Fabrication of gold nanowires using self-organized porous alumina template
    Kwon, Hyunsook
    Lee, Seungeun
    Kwon, O'Dae
    [J]. IEEE NMDC 2006: IEEE NANOTECHNOLOGY MATERIALS AND DEVICES CONFERENCE 2006, PROCEEDINGS, 2006, : 406 - 407
  • [4] Fabrication of self-organized InP nanopillars by ion-bombardment for optoelectronic applications
    Ravishankar, Ajith Padyana
    Haddad, Gabriel
    Jaramillo-Fernandez, Juliana
    Visser, Dennis
    Sotomayor Torres, Clivia Marfa
    Anand, Srinivasan
    [J]. 2019 IEEE 14TH NANOTECHNOLOGY MATERIALS AND DEVICES CONFERENCE (NMDC), 2019,
  • [5] Preparation of silicon nanopillars array using gold nanoparticles as etching mask
    Zhao, Bao-Jun
    Wang, Ying
    Zhang, Ya-Fei
    [J]. 2007, Weixi Jiagong Jishu, Changsha, 410111, China
  • [6] Self-organized fabrication of periodic arrays of vertical, ultra-thin nanopillars on GaAs surfaces
    Riedl, Thomas
    Lindner, Joerg K. N.
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2014, 211 (12): : 2871 - 2877
  • [7] Fabrication of GaInAs quantum disks using self-organized InP islands as a mask in wet chemical etching
    Sopanen, M
    Lipsanen, H
    Ahopelto, J
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (26) : 4029 - 4031
  • [8] Nanopatterning of silicon with use of self-organized porous alumina and colloidal crystals as mask
    Ono, Sachiko
    Oide, Akihiko
    Asoh, Hidetaka
    [J]. ELECTROCHIMICA ACTA, 2007, 52 (08) : 2898 - 2904
  • [9] Patterning of silicon nanopillars formed with a colloidal gold etch mask
    Lewis, PA
    Ahmed, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 3239 - 3243
  • [10] Fabrication of optical reflectors by using of elastomer with self-organized undulations
    Wang, Jui-Hao
    Shih, Teng-Kai
    Chen, Chia-Fu
    Chen, Kuang-Chung
    Chen, Chien-Chung
    Whang, Wha-Tzong
    Huang, G. Steven
    Su, Hsiang-Yi
    [J]. OPTICS COMMUNICATIONS, 2008, 281 (15-16) : 3953 - 3956
12345