Morphology of sputtering damage on Cu(111) studied by scanning tunneling microscopy

被引：29

作者：

Naumann, J

Osing, J

Quinn, AJ

Shvets, IV

机构：

[1] UNIV DUBLIN TRINITY COLL,DEPT PHYS,DUBLIN 2,IRELAND

[2] UNIV KARLSRUHE,INST PHYS,FAK PHYS,D-7500 KARLSRUHE,GERMANY

[3] UNIV ERLANGEN NURNBERG,NATURWISSENSCH FAK,INST PHYS 4,NURNBERG,GERMANY

[4] CATHOLIC UNIV NIJMEGEN,NIJMEGEN,NETHERLANDS

来源：

SURFACE SCIENCE | 1997年 / 388卷 / 1-3期

关键词：

copper; ion damage; low index single crystal surfaces; scanning tunneling microscopy; sputtering; surface diffusion;

D O I：

10.1016/S0039-6028(97)00397-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The morphology of Cu(111) after bombardment with 1 keV Ar ions and its dependence on temperature have been investigated using STM. Qualitative agreement is found with experiments conducted by other groups on Pt(111), but with more pronounced temperature influences. In addition, interlayer mass transport was observed to have a more important effect on Cu(111). The Cu(111) surface only slowly approaches equilibrium shape at room temperature. A series of images illustrates how the surface changes over a period of several hours following ion bombardment. (C) 1997 Elsevier Science B.V.

引用

页码：212 / 219

页数：8

共 50 条

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