Advanced writing strategies for high-end mask making

被引：2
|
作者：
Lemke, M [1 ]
Gramss, J [1 ]
Doering, HJ [1 ]
Eichhorn, H [1 ]
Schubert, G [1 ]
机构：
[1] Leica Microsyst Lithog GmbH, Jena, Germany
来源：
16TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS | 2000年 / 3996卷
关键词：
D O I：
10.1117/12.377107
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
In general the writing strategies of the Leica ZBA 320 tool are presented to the audience. Methods to achieve a high productivity in writing masks of the next generation are highlighted. Thus, such writing modes like variable-shaped beam (VSB) using 6 shape types, vector scan and "writing-on-the-fly" are explained in their inter-action. Our strategies to constantly improve the accuracy parameters, such like n-pass writing and soft boundaries are not only described but also illustrated by our latest application results. Finally data processing by hierarchical data structures as the main factor to support the above-mentioned writing strategies is outlined in this paper.
引用
收藏
页码：166 / 174
页数：9
相关论文
共 50 条
  • [1] Making high-end parts
    Aronson, RB
    [J]. MANUFACTURING ENGINEERING, 2005, 135 (04): : 85 - +
  • [2] Advanced μ-Bolometer detectors for high-end applications
    Mizrahi, U.
    Schapiro, F.
    Bykov, L.
    Giladi, A.
    Shiloah, N.
    Pivnik, I.
    Elkind, S.
    Maayani, S.
    Mordechai, E.
    Farbman, O.
    Hirsh, Y.
    Twitto, A.
    Ben-Ezra, M.
    Fraenkel, A.
    [J]. INFRARED TECHNOLOGY AND APPLICATIONS XXXVIII, PTS 1 AND 2, 2012, 8353
  • [3] A high-end mask writer using a spatial light modulator
    Ljungblad, U
    Askebjer, P
    Karlin, T
    Sandstrom, T
    Sjöberg, H
    [J]. MOEMS Display and Imaging Systems III, 2005, 5721 : 43 - 52
  • [4] High-end mask manufacturing using spatial light modulators
    Ljungblad, U
    [J]. SOLID STATE TECHNOLOGY, 2005, 48 (04) : S8 - S10
  • [5] Strategies for Chinese Domestic High-End Clothing Brand
    Zhou, Yueni
    Li, Xiaohui
    [J]. 2013 INTERNATIONAL CONFERENCE ON MANAGEMENT AND INFORMATION TECHNOLOGY, 2013, : 432 - 437
  • [6] MAKING IT COMPATIBLE AND BETTER - DESIGNING A NEW HIGH-END COMPUTER
    APPELT, DR
    [J]. ELECTRONICS, 1979, 52 (21): : 131 - 136
  • [7] HIGH-END ULTRAPORTABLES
    不详
    [J]. BYTE, 1995, 20 (10): : 148 - 148
  • [8] The high-end goods
    Kruger, D
    [J]. FORBES, 2003, 171 (01): : 38 - 38
  • [9] High-End Hiking
    Bruner, Jon
    [J]. FORBES, 2011, 188 (05): : 70 - 70
  • [10] High-end design
    Chadwick, Philip
    [J]. Packaging News, 2023, (September-October): : 35 - 37
12345