Microwave planar antenna with RF-sputtered indium tin oxide films

被引：2
|
作者：
Outaleb, N [1 ]
Pinel, J
Drissi, M
Bonnaud, O
机构：
[1] Univ Rennes 1, UPRESA6076, Lab Grp Microelect & Visualisat, F-35042 Rennes, France
[2] INSA Rennes, LCST, UPRESA6075, F-35043 Rennes, France
来源：
MICROWAVE AND OPTICAL TECHNOLOGY LETTERS | 2000年 / 24卷 / 01期
关键词：
indium tin oxide films (ITO); RF sputtering; microstrip antenna;
D O I：
10.1002/(SICI)1098-2760(20000105)24:1<3::AID-MOP2>3.3.CO;2-8
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A transparency printed antenna realized with indium in oxide films (ITO) is investigated. ITO films are deposited on a glass substrate by reactive RF sputtering. A microstrip antenna is rigorously analyzed and optimized, with a full-wave approach, to operate at 5.8 GHz. The obtained theoretical results are compared to the measured ones, where a satisfactory agreement confirms the validity of the proposed technology for microwave applications. (C) 2000 John Wiley & Sons, Inc.
引用
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页码：3 / 7
页数：5
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