Beyond CMOS Technology

被引:0
|
作者
Tonti, William [1 ,2 ]
机构
[1] IEEE Future Direct, 445 Hoes Lane, Piscataway, NJ 08854 USA
[2] IEEE, Piscataway, NJ USA
关键词
D O I
暂无
中图分类号
TP301 [理论、方法];
学科分类号
081202 ;
摘要
引用
收藏
页数:5
相关论文
共 50 条
  • [1] Ge technology beyond Si CMOS
    Chin, Albert
    E-MRS 2012 SPRING MEETING, SYMPOSIUM M: MORE THAN MOORE: NOVEL MATERIALS APPROACHES FOR FUNCTIONALIZED SILICON BASED MICROELECTRONICS, 2012, 41
  • [2] CMOS technology - Year 2010 and beyond
    Iwai, H
    IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1999, 34 (03) : 357 - 366
  • [3] Hardware Security for and beyond CMOS Technology
    Knechtel, Johann
    PROCEEDINGS OF THE 2020 INTERNATIONAL SYMPOSIUM ON PHYSICAL DESIGN (ISPD'20), 2020, : 75 - 86
  • [4] Technology Options for Beyond-CMOS
    Young, Ian A.
    ISPD'17: PROCEEDINGS OF THE 2017 ACM INTERNATIONAL SYMPOSIUM ON PHYSICAL DESIGN, 2017, : 1 - 1
  • [5] Challenges of 22 nm and beyond CMOS technology
    HUANG Ru1
    2 Semiconductor Manufacturing International Corporation (SMIC)
    Science China(Information Sciences), 2009, (09) : 1491 - 1533
  • [6] Challenges of 22 nm and beyond CMOS technology
    Huang Ru
    Wu HanMing
    Kang JinFeng
    Xiao DeYuan
    Shi XueLong
    An Xia
    Tian Yu
    Wang RunSheng
    Zhang LiangLiang
    Zhang Xing
    Wang YangYuan
    SCIENCE IN CHINA SERIES F-INFORMATION SCIENCES, 2009, 52 (09): : 1491 - 1533
  • [7] Reliability on Evolutionary FinFET CMOS Technology and Beyond
    Choi, Kihyun
    Sagong, Hyun Chul
    Jin, Minjung
    Hai, Jiang
    Lee, Miji
    Jeong, Taeyoung
    Yeo, Myung Soo
    Shim, Hyewon
    Ahn, Da
    Kim, Wooyeon
    Kim, Yongjeung
    Park, JuneKyun
    Rhee, Hwasung
    Lee, Euncheol
    2020 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2020,
  • [8] Evolution of CMOS technology at 32 nm and beyond
    Shahidi, Ghavam G.
    PROCEEDINGS OF THE IEEE 2007 CUSTOM INTEGRATED CIRCUITS CONFERENCE, 2007, : 413 - 416
  • [9] Challenges of 22 nm and beyond CMOS technology
    HUANG Ru WU HanMing KANG JinFeng XIAO DeYuan SHI XueLong AN Xia TIAN Yu WANG RunSheng ZHANG LiangLiang ZHANG Xing WANG YangYuan Department of Microelectronics Peking University Beijing China Semiconductor Manufacturing International Corporation SMIC Beijing China
    ScienceinChina(SeriesF:InformationSciences), 2009, 52 (09) : 1491 - 1533
  • [10] Challenges of 22 nm and beyond CMOS technology
    Ru Huang
    HanMing Wu
    JinFeng Kang
    DeYuan Xiao
    XueLong Shi
    Xia An
    Yu Tian
    RunSheng Wang
    LiangLiang Zhang
    Xing Zhang
    YangYuan Wang
    Science in China Series F: Information Sciences, 2009, 52 : 1491 - 1533