Photocatalytic reduction of CO2 with H2O on Ti-containing porous silica thin film photocatalysts

被引：76
|
作者：
Ikeue, K
Nozaki, S
Ogawa, M
Anpo, M
机构：
[1] Univ Osaka Prefecture, Grad Sch Engn, Dept Appl Chem, Sakai, Osaka 5998531, Japan
[2] Waseda Univ, Dept Earth Sci, Shinjuku Ku, Tokyo 1698050, Japan
来源：
CATALYSIS LETTERS | 2002年 / 80卷 / 3-4期
关键词：
mesoporous thin film; reduction of CO2; photocatalyst; formation of CH3OH; quantum yield;
D O I：
10.1023/A:1015400223708
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO2 with H2O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO2 and H2O led to the formation of CH4 and CH3OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.
引用
收藏
页码：111 / 114
页数：4
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